AST 210/EE 213 - Lecture 28: EUV lithography
Applied Science & Technology 210 / Electrical Engineering 213: Soft X-Rays and Extreme Ultraviolet Radiation
Lecture 28: EUV lithography
http://www.coe.berkeley.edu/AST/sxreuv/
Professor David T. Attwood, Electrical Engineering Professor in Residence, Professor Attwood’s research interests include short wavelength electromagnetics, soft x-ray microscopy, coherence, and EUV lithography.
[courses] [ee213] [fall2005]
Duration : 1:5:13
Talk soon,
Joe Beaven
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SJCJoosten Says:
It seems like the …
It seems like the professor was right in saying that 2009 for EUV is too optimistic. Intell has announced that EUV will not be used for 22nm lithography in 2011.
Posted on December 11th, 2008 at 12:40 pm